Emission Spectrographic Determination of Metallic Impurities in Silicon Nitride by a Solution Method,
Abstract
mpurities in Silicon Nitride by a Solution Method,Product technical rept.,Ferraro,Thomas A. , Jr.;Strauss,Bernard H. ;AMMRC-PTR-73-5(*silicon compounds, chemical analysis), (*atomic spectroscopy, silicon compounds), nitrides, impurities*silicon nitrides, *spectrochemical analysis, dissolvingA method for the dissolution and spectrographic analysis of silicon nitride is described. Samples are dissolved in teflon-lined acid digestion bombs using a mixture of hydrofluoric and nitric acids. After removal of silicon as the volatile fluoride, the samples are analyzed by a solution-spectrographic method. Results and standard deviations obtained for aluminum, iron, titanium, chromium, manganese, magnesium, and calcium are reported. The values are compared with those obtained by spectrophotometric methods. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 01, 1973
- Accession Number
- AD0761104
Entities
People
- Bernard H. Strauss
- Thomas A. Ferraro Jr.
Organizations
- United States Army Research Laboratory