Photoplastic Recording Materials.
Abstract
The objective of this program was the characterization and development of photoplastic materials for optical memory storage applications. The mechanism of hologram formation in photoplastic materials was studied. A new technique of parallel- plane charging was developed and found to be preferable to corona charging. A study of the PVK-TNF photoconductor system revealed the mechanism of photoconduction and indicated that the origin of the latent image is immobilized electrons. Although photoplastic materials do not meet all of the desired requirements of a storage medium, they are able to meet most of these requirements. Photoplastics have a read- write-erase capability with permanent storage until intentional erasure. Development and erasure can be independently controlled on a localized scale by arranging the hologram sites in an array or by heating the holograms with a steerable laser beam. The thin phase holograms formed by photoplastics are efficient, and are insensitive to light except during the write step. The material is not only panchromatic, but has an exposure sensitivity less than one microjoule per square millimeter. The resolution of photoplastic materials is adequate for most optical memory applications. (Author, modified-PL)
Document Details
- Document Type
- Technical Report
- Publication Date
- Aug 01, 1973
- Accession Number
- AD0764822
Entities
People
- Joel B. Dubow
- Willis S. Colburn