Fluorine Pressure Change Monitor for a Reacting System.
Abstract
Recent experimental results on the performance of a pulsed HF chemical laser have indicated that the presence of HF in the chemical reactants prior to laser initiation degrade the laser performance. In order to monitor the amount of HF produced when the chemical reactants are mixed, a device has been developed that measures the change in concentration of one of the reactants. This device, which relies on the absorption of light by molecular F2, has been shown to have an accuracy of better than 5 percent in the measurement of the F2 pressure. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Sep 01, 1973
- Accession Number
- AD0766259
Entities
People
- Lee D. Bergerson
- Steven N. Suchard
Organizations
- The Aerospace Corporation