HF Chemical Lasing at Higher Vibrational Levels.
Abstract
HF chemical lasing has been obtained from the P6(5) and P6(4) transitions as well as several P5 and P4 transitions of HF. Lasing from these high vibrational levels was produced by transverse, pulsed discharges in mixtures of HI He, and SF6 or SO2F2. The low bond energy of HI contributed to the doubling of the energy of laser pulses when substituted for H2. The HF laser frequencies were measured for other low bond energy sources of H atoms.
Document Details
- Document Type
- Technical Report
- Publication Date
- Sep 01, 1973
- Accession Number
- AD0766411
Entities
People
- Dean C. Taylor
- M. A. Kwok
- S. W. Mayer
Organizations
- The Aerospace Corporation