Features of Element Distribution in the Diffusion Layers of a Three-Component System Based on Titanium,
Abstract
In this paper an attempt has been made to establish the influence of a third element when there is a slight content of it in titanium and vandium (1-3 wt. percent) on their mutual diffusion and the distribution of elements in the diffusion layer. As the third element aluminum and tin were selected, since they increase the stability of a low-temperature hexagonal close-packed (GPU) modification of titanium (alpha-stabilizers), and molybdenum, which, like vanadium, increases the stability of high-temperature face-centered cubic (OTsK) modification of titanium (beta-stabilizers). (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Aug 16, 1973
- Accession Number
- AD0766569
Entities
People
- M. G. Chudinov
- S. G. Fedotov
Organizations
- National Air and Space Intelligence Center