NRL Van de Graaff Operation, 1 January-31 December 1972.
Abstract
The Van de Graaff was modified to accommodate a modified version of the Hill-Nelson sputtering-type ion source in order to provide a beam of nickel ions for the simulation of neutron damage to nuclear reactor materials. This development also opens the way for other experiments with a variety of metallic ions in the MeV energy region. Irradiations of nickel foils, other metals, and alloys were carried out in the simulation program to study void formation in reactor materials. An extensive program on the modification of silicon carbide included ion implantation, luminescence studies, and depth composition profiling of implanted aluminum. A remarkable depth resolution of less than 20 angstroms in the near-surface region was achieved in the profiling work by means of the nuclear resonance method. Exploratory profiling measurements for sodium in thin layers of silicon dioxide were carried out. Many implantations were made in connection with solid-state device development, optical waveguide formation, and to study changes in the optical properties of solids. High resolution measurements of spectra resulting from ion implantation solids have been made to investigate x-ray production and multiple inner-shell vacancy production. (Modified author abstract)
Document Details
- Document Type
- Technical Report
- Publication Date
- Aug 01, 1973
- Accession Number
- AD0769665
Entities
People
- K. L. Dunning
Organizations
- United States Naval Research Laboratory