Fabrication Procedure for Silicon Membrane X-Ray Lithography Masks.

Abstract

CH LEXINGTON LINCOLN LABFabrication Procedure for Silicon Membrane X-Ray Lithography Masks.Technical note,Cohen,Ronald A. ;Mountain,Robert W. ;Smith,Henry I. ;Lemma,Muriel A. ;Spears,David L. ;TN-1973-38F19628-73-C-0002DA-7-X-263304-D-215ESDTR-73-248(*X ray diffraction, *Masking), (*Wafers, X ray diffraction), Silicon, Membranes, Etching, Boron, FabricationA step-by-step procedure for the fabrication of silicon membrane x-ray lithography masks is described. The procedure involves the diffusion of boron into the polished face of an n-type <100> silicon wafer, the formation of gold absorber patterns on the boron diffused face, and the selective etching of the n-type silicon so as to produce thin membranes (2 to 5 microns thick) of silicon supporting the absorber patterns. (Author)

Document Details

Document Type
Technical Report
Publication Date
Sep 20, 1973
Accession Number
AD0769857

Entities

People

  • David L. Spears
  • Henry I. Smith
  • Muriel A. Lemma
  • Robert W. Mountain
  • Ronald A. Cohen

Organizations

  • Massachusetts Institute of Technology

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Diffraction
  • Diffusion
  • Fabrication
  • Lithography
  • Lithography (Fabrication)
  • Membranes
  • Mountains
  • X Ray Lithography
  • X Rays
  • X-Ray Diffraction

Readers

  • Aerospace Test and Evaluation
  • Nanofabrication and Microfabrication.
  • Semiconductor Device Technology