Sputtered Thin Film Research

Abstract

Progress on the process development as it relates to the optical quality of sputtered single crystal films of ZnO, AlN, and TiO2 is discussed. Optical attenuation data for optical waveguide structures comprised of zinc oxide, aluminum nitride, titanium dioxide films grown on sapphire substrates and titanium dioxide on YZ cut lithium niobate is presented. The effect of depositon parameters on the carrier mobility of single crystal gallium arsenide films grown by reactive sputtering is presented.

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Document Details

Document Type
Technical Report
Publication Date
Oct 01, 1973
Accession Number
AD0769972

Entities

People

  • Alexander J. Shuskus
  • D. E. Cullen
  • D. J. Quinn
  • E. L. Paradis
  • J. M. Berak

Organizations

  • United Technologies Corporation

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Carrier Mobility
  • Chemistry
  • Compound Semiconductors
  • Crystal Structure
  • Crystallography
  • Crystals
  • Diffraction
  • Electrical Properties
  • Epitaxial Growth
  • Measurement
  • Optical Properties
  • Optics
  • Refraction
  • Refractive Index
  • Scattering
  • Spectra
  • Spectroscopy

Fields of Study

  • Physics

Readers

  • Materials Science and Engineering.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene