Electronic Exposure Measurement in Photomechanical Processes,

Abstract

The article describes a simple device making it possible to use photographic exposure in photomechanical processes. The diagram of this device is illustrated and described. The electronic measurement of exposure makes it possible to reduce the time for each operation by 6-8 seconds, increases the quality of positive copies, and sharply reduced the amount of defective work.

Document Details

Document Type
Technical Report
Publication Date
Aug 21, 1973
Accession Number
AD0771086

Entities

People

  • Yu. A. Fedorov

Organizations

  • United States Army Foreign Science and Technology Center

Tags

Communities of Interest

  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Measurement

Fields of Study

  • Physics

Readers

  • Applied Combinatorial Optimization and Logic Circuit Design.
  • Computer Science/Computer Engineering/Data Science/Digital Signal Processing.
  • Thermal Physics or Thermal Science.

Technology Areas

  • Microelectronics