Electron Beam Microanalysis of Electrochemical Attack on Thin Film Nickel-Chromium Resistors

Abstract

The purpose of the report is to present the results of the electron beam microanalysis (EBM) studies which have led to the development of a model for the observed electrochemical reaction. The intent was to correlate, principally through use of an electron microprobe, the various chemical characteristics of the integrated circuit with the behavior of thin film nickel-chromium resistors. Other pertinent features of the devices were studied with several additional techniques including scanning electron microscopy and mass spectrometry.

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Document Details

Document Type
Technical Report
Publication Date
Oct 01, 1973
Accession Number
AD0772677

Entities

People

  • John J. Bart

Organizations

  • Rome Laboratory

Tags

DTIC Thesaurus Topics

  • Chemical Analysis
  • Chemical Reactions
  • Chemical Synthesis
  • Chemistry
  • Electrochemical Reactions
  • Electron Beams
  • Electron Microscopy
  • Electronics Industry
  • Film Resistors
  • Integrated Circuits
  • Mass Spectrometry
  • Materials
  • Microscopy
  • Scanning Electron Microscopy
  • Thin Film Resistors
  • Thin Films
  • X Rays

Readers

  • Computational Modeling and Simulation
  • International Journalism and Media Studies.
  • Nanoscale Plasmonic Nanotechnology

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene