Electron-Beam Irradiated Discharges Considered for Initiating High-Pressure Pulsed Chemical Lasers.

Abstract

Volumetric irradiation by a short-pulse electron beam has been used to trigger long-duration, spatially uniform electric discharges in gas mixtures of He and F2 or SF6. Uniform energy deposition to 300 J/liter has been observed for atmospheric F2-He mixtures at nominal e-beam currents of 3 A/sq cm and discharge currents up to 20 A/sq cm. Operation suitable for efficient initiation of pulsed HF/DF chain lasers appears possible over a wide range of E/N and mixture ratios, limited by breakdown at large E/N and negligible field enhancement at low E/N. Approximate analytical plasma models are presented and used in conjunction with time-resolved afterglow current measurements ot obtain rate constants for F- ion-F2+ ion recombination and F2+ ion-electron recombination. Estimates of F2 dissociation fractions achieved in the experiments imply the possibility of scalable and efficient initiation of pulsed chemical lasers with such discharges. (Author)

Document Details

Document Type
Technical Report
Publication Date
Oct 31, 1973
Accession Number
AD0774095

Entities

People

  • Alfred Ching
  • James S. Whittier
  • Martin L. Lundquist
  • Robert Hofland

Organizations

  • The Aerospace Corporation

Tags

DTIC Thesaurus Topics

  • Afterglows
  • Chemical Lasers
  • Dissociation
  • Electric Discharges
  • Electron Beams
  • Electrons
  • High Pressure
  • Lasers
  • Measurement
  • Pressure Measurement

Fields of Study

  • Physics

Readers

  • Molecular Photonics/Laser Physics
  • Pulsed Power and Plasma Physics.

Technology Areas

  • Directed Energy
  • Directed Energy - Lasers
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene