High Temperature Oxidation of Graphite by a Dissociated Oxygen Beam
Abstract
Graphite oxidation by dissociated oxygen has been studied by molecular beam-mass spectrometry techniques. A high temperature atomic oxygen beam source (capable of generating an atom-to-molecule flux ratio of 0.5) and a modulated, pulse-counting detection scheme have been developed for the study. The target (isotropic graphite) temperature was varied from 1000 to 1700K with a beam temperature range of 300 to 2200K and an equivalent beam pressure of about 10 to the minus eighth 10 to minus ninth power atm. Measurements were carried out in the principal plane, and both beam incident and detector angles, measured from the target normal, were varied independently.
Document Details
- Document Type
- Technical Report
- Publication Date
- Aug 01, 1973
- Accession Number
- AD0779949
Entities
People
- George Nung-keung Liu
Organizations
- Massachusetts Institute of Technology