Structure-Sensitive Chemisorption: Hydrogen and Nitrogen on Single Crystal Planes of Tungsten and Rhodium.
Abstract
The limiting mechanism in the dissociative adsorption of hydrogen and nitrogen on the closest packed planes of tungsten and rhodium has been investigated. In particular, the author has sought to determine how the rate of interaction varies with exposure and substrate temperature in order to establish under what conditions the interaction of these gases with the metal surface can be entirely prevented. In those cases where adsorption can be inhibited, the possible mechanisms responsible for limiting the rate of interaction have been explored. The available experimental data is reviewed. The experimental conditions dictating a choice of experimental technique employed in these measurements and the details of the experimental procedures are discussed.
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 01, 1974
- Accession Number
- AD0780040
Entities
People
- Richard Samuel Polizzotti
Organizations
- University of Illinois Urbana–Champaign