Sputtered Thin Film Research

Abstract

Amorphous films of neodymium ultraphosphate and neodymium lanthanum ultrophosphate have been deposited by r.f. sputtering. Optical waveguide structures were fabricated and scattering losses were measured to be less than one dB/cm. Fluorescence lifetime measurements of Nd sup (3 tau) are presented. Data on growth of single crystal films of gallium nitride and tungsten trioxide by reactive sputtering is given. Reduced scattering losses in optical waveguide structures of zinc oxide grown on sapphire have been effected by reduction of secondary electron bombardment of the substrate during film growth. Data is presented on the effect of magnetic field configuration on suppressing secondary electron bombardment and its effect on film uniformity.

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Document Details

Document Type
Technical Report
Publication Date
May 01, 1974
Accession Number
AD0780277

Entities

People

  • Alexander J. Shuskus
  • D. E. Cullen
  • D. J. Quinn
  • E. L. Paradis
  • J. M. Berak

Organizations

  • United Technologies Corporation

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies
  • Sensors

DTIC Thesaurus Topics

  • Compound Semiconductors
  • Crystals
  • Detectors
  • Electrical Properties
  • Epitaxial Growth
  • Gallium Nitrides
  • Laser Applications
  • Light (Electromagnetic Radiation)
  • Materials
  • Measurement
  • Optical Absorption
  • Optical Waveguides
  • Power
  • Scattering
  • Single Crystals
  • Tungsten
  • Waveguides

Fields of Study

  • Physics

Readers

  • Microwave Engineering.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene