Deposition Profiles by Vaporization Expansion Wave Method.
Abstract
A scheme is presented for measurement of deposition profiles in electrically conducting materials, effective in an energy range in which the material is in the mixed liquid-vapor state. An oscillographic record of sensor resistance may be made to yield a plot of deposited energy as a function of depth in the sensor by use of a slow, vaporization-expansion wave model. The results of tests in copper and aluminum sensors are shown and steps to improve accuracy are discussed. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 01, 1974
- Accession Number
- AD0781494
Entities
People
- Henry S. Burden
Organizations
- Ballistic Research Laboratory