Determination of the Sign of Carrier Transported across SiO2 Films on Si

Abstract

A technique has been developed for determination of the sign of charge carrier transported across an insulating film on a semiconductor substrate, using the charge carrier separation properties of a shallow p-n junction diffused into the semiconductor. For thermally grown SiO2, unmetallized and contacted by a corona discharge in dry air, electrons are found to carry the current for both polarities of surface potential. Also demonstrated is electron- hole pair production in the Si by electrons entering from the oxide.

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Document Details

Document Type
Technical Report
Publication Date
Apr 01, 1974
Accession Number
AD0782471

Entities

People

  • Murray A. Lampert
  • Walter C. Johnson
  • Zeev A. Weinberg

Organizations

  • Princeton University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Air Force
  • Bipolar Junction Transistors
  • Charge Carriers
  • Conduction Bands
  • Dielectrics
  • Electric Fields
  • Electron Holes
  • Electronics Laboratories
  • Electrons
  • Kinetic Energy
  • Narrow Band Gap Semiconductors
  • New Jersey
  • Oxides
  • P-N Junctions
  • Pair Production
  • Semiconductors
  • Substrates

Fields of Study

  • Materials science

Readers

  • Semiconductor Device Technology

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene