Conduction Mechanisms in Thick Film Microcircuits

Abstract

It was demonstrated that neither direct observation of neck growth nor measurements of the shrinkage of composites can be applied to establish initial stage sintering kinetics for RuO2 in the presence of glass. Three secondary measurement techniques (microstructure determination, X-ray line broadening, and surface area measurements) were employed and results were shown to be consistent among the three techniques. Studies of the ripening process whereby large crystals of RuO2 grow in the glassy matrix uncovered a strong chemical interaction between the glass and the alumina substrate which significantly influences the rate of the ripening process. In particular, the substrate tends to inhibit the growth of RuO2 crystals, which is a desirable situation if the conductive network is to be preserved.

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Document Details

Document Type
Technical Report
Publication Date
Aug 01, 1974
Accession Number
AD0787487

Entities

People

  • R. W. Vest

Organizations

  • Purdue Research Foundation

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Chemical Reactions
  • Coefficients
  • Electrical Properties
  • Films
  • Geometry
  • Materials
  • Materials Engineering
  • Materials Processing
  • Materials Science
  • Measurement
  • Microstructure
  • Particle Size
  • Resistors
  • Thermal Expansion
  • Thick Films
  • X Rays
  • X-Ray Diffraction

Readers

  • Internal Combustion Engine (ICE) Technology.
  • Powder metallurgy of Titanium alloys.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene