THIN FILM ACCELERATED LIFE TESTS.
Abstract
The purpose of this program was to study, investigate and develop test and measurement techniques for controllably accelerating the aging processes in tantalum thin film R-C networks, and to investigate the physics of failure associated with the networks. Construction and accelerated stress testing of tantalum thin-film resistors and capacitors and resistor capacitor networks was conducted to establish a means of predicting use level failure rates and to determine the failure modes and mechanisms associated with these networks. Most of the work was performed on networks formed on silicon substrates. Ion migration, crystallization and oxidation have been identified as the failure mechanisms. Acceleration factors have been determined from preferred stress levels and related to normal use conditions. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 01, 1966
- Accession Number
- AD0803767
Entities
People
- M. J. Walker
- M. Sharp