STRESS CONCENTRATION FACTORS FOR MULTIPLE SEMIELLIPTICAL NOTCHES IN BEAMS UNDER PURE BENDING.
Abstract
Uniformly spaced semielliptical notches in rectangular beams under pure bending are examined photoelastically. Minimum stress concentration factors, produced by multiple elliptical notching of beams, are obtained for wide ranges of notch width, semiminor elliptical axis, notch depth, notch pitch, and depth of beam. In particular, the geometries of the optimum elliptical notch producing the least stress concentration are obtained for a practical range of parameters. Stress concentration factors for beams with multiple semielliptical notches are compared to those for beams with single semielliptical notches and to those for beams with semicircular notches. The maximun reduction of stress concentration factor for beams with multiple semielliptical notches is to approximately 37 percent of the stress concentration factor for beams with single semielliptical notches. Within the range of parameters investigated, the stress concentration factor for beams with multiple semielliptical notches was reduced to 15 to 37 percent less than that for multiple semicircular notches. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 01, 1967
- Accession Number
- AD0813682
Entities
People
- Alfred Ching
- Ching Tsao
- Seichi Okubo
Organizations
- The Aerospace Corporation