MICROWAVE ELECTRONICALLY VARIABLE ION BEAM TIME DELAY DEVICE STUDY.
Abstract
Studies conducted this quarter on the ion-beam variable delay line are reported. Emphasis is placed on the ion sources and coupler theory and test. High percentage active material emitters sintered at 1400 C appear to give longer life; the life test behavior of ion current emission can be approximately explained by diffusion of active material from a finite slug. Secondary electron emission due to ion bombardment of metals has also been investigated. A threshold ion energy is found and the emission appears to be governed by the alkali-atom coverage of the metals. No significant yield is found for ions of about 500 eV energy. Ion beams of density 4-5 mA/sq cm have been extracted from a plasma, with a spreading governed by space charge neutralization and ion-atom collisions. The coupler theory is summarized as a coupling matrix, with numerical results included. Oscillation in a 10-gap coupler is found to be unlikely. Additional tests on the 50 MHz coupler have been performed. Conclusions and future plans are given. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 01, 1967
- Accession Number
- AD0814988
Entities
People
- K. K. Chow
Organizations
- M/A-COM Technology Solutions