APPARATUS FOR THE MANUFACTURE OF DIELECTRIC MULTIPLE LAYERS (EINE APPARATUR ZUR HERSTELLUNG DIELEKTRISCHER VIELFACHSCHICHTEN),

Abstract

An apparatus for the manufacture of dielectric multiple layers is described. The optical thickness of the layer is measured during the evaporation process using light of a given wavelength by determining the reflectivity with a two-ray chopped-light process. With this method, the determination of layer thickness is largely independent of external disturbances. A Fabry-Perot interferometer was manufactured with these dielectric multiple layers and the hyperfine structure of the Hg e line 4358 A from a low-pressure mercury burner was photographed. (Author)

Document Details

Document Type
Technical Report
Publication Date
Sep 20, 1967
Accession Number
AD0834933

Entities

People

  • G. Schreiber
  • M. O. Wendt

Organizations

  • National Air and Space Intelligence Center

Tags

Communities of Interest

  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Evaporation
  • Fabry Perot Interferometers
  • Hyperfine Structure
  • Instrumentation
  • Interferometers
  • Measuring Instruments
  • Optical Interferometers
  • Physical Properties
  • Reflectivity
  • Thickness

Fields of Study

  • Physics

Readers

  • Optical Physics and Photonics.
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  • Thin Film Deposition Science.