DEVELOPMENT OF A BURIED-GATE POWER FIELD-EFFECT TRANSISTOR.
Abstract
Parasitic components of junction gate and insulated-gate field-effect-transistors were examined. Particular emphasis was directed toward evaluating their effects of the high-frequency performance of these devices. Using the results of this examination, a modified version of the initial power MOSFET was designed. The first run produced devices with similar d-c characteristics, but greatly reduced parasitic capacitance values. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 01, 1968
- Accession Number
- AD0836102
Entities
People
- W. C. Bruncke
Organizations
- Texas Instruments