METHOD OF MANUFACTURING FERROMAGNETIC LAYERS BY VAPORIZATION ONTO PLANE SUBSTRATES (ZPUSOB VYROBY FERROMAGNETICKYCH VRSTEV NAPAROVANIM NA ROVINNE PODLOZKY),
Abstract
It was established that for every ferromagnetic material the angle of incidence of its atoms on the substrate during deposition uniquely and permanently determines the magnitude and direction of magnetic anisotropy. Therefore, it is possible to fabricate thin films with the desired anisotropy by using any ferromagnetic material. The patent describes a method of fabricating thin films by deposition in deep vacuum on flat substrates, the novelty being that the source of ferromagnetic material is so positioned that the depositing atoms would fall on the substrate at any desired fixed angle from 0 to 90 deg. The thin films thus obtained have the desired anisotropic constant. The anisotropy of these thin films is completely stable in time, and therefore, they are very convenient for the production of memory and logic elements of computers. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Sep 13, 1967
- Accession Number
- AD0841249
Entities
People
- Jan Grolmus
- Miroslav Ondris
- Vladimir Kambersky
- Zdenek Frait
- Zdenek Malek
Organizations
- National Air and Space Intelligence Center