POLYTECHNIC INSTITUTE, BRESLAU. SCIENTIFIC PAPERS, NO. 7, 1964 (SELECTED ARTICLES),
Abstract
The effect of technological conditions and thickness on the resistivity of chromium films was investigated on films ranging in thickness from 70 to 1200A. Films with the lowest resistivity of 60 micro-ohms cm are obtained in vacuum, improved by a getter, during condensation on a substrate heated to 360C. Films with the highest resistivity of 140 micro-ohms cm are obtained at a substrate temperature of 50C in a vacuum of 0.0001 mm Hg. Two groups of thin chromium films, obtained under most and least favorable gas adsorption conditions, were investigated. The reflection coefficients R and R' from the air side and substrate side, respectively, and the transmittance coefficient T were measured in the wavelength lambda ranging from 1000 to 10,000A on films varying in thickness d from 100 to 1000A. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 03, 1967
- Accession Number
- AD0841534
Entities
People
- Elzbieta Idczak
- Stanislawa Dembicka-jellonkowa
Organizations
- National Air and Space Intelligence Center