Research on the Electrochemical Oxidation of Hexane and its Isomers
Abstract
The oxidation of CH4 on Pt electrodes in 80% H3PO4 was studied at 110 and 130C. Particular emphasis has been placed on possible methods of developing non-noble metal catalysts. The difficulties associated with this development, in particular corrosion, are discussed. A possible method of overcoming these difficulties and of stabilizing non-noble methods is described, involving their adsorption in submonolayer quantities. A study of Cu adsorbed on both smooth and platinized Pt was made. In presence of Cu(++), Cu is adsorbed onto Pt at a rate limited by Cu(++) diffusion. Cu adsorbs less rapidly in presence of CH4, than in its absence. There is a distinct difference in behavior between Cu and the Cu + CH4 combined layer with respect to behavior on open circuit after formation. On platinized Pt the charge to oxidize the combined Cu + CH4 layer is considerably greater than the corresponding charge for pure CH4. The over-all oxidation rate of CH4 is inhibited in presence of Cu(++) and concentrations of Cu(++) as low as 60 parts per billion significantly decrease the hydrocarbon oxidation rate. It is shown that this inhibition arises substantially from the inhibition of the rate-limiting step of the CH4 oxidation reaction, i.e. the oxidation of O-type to CO2.
Document Details
- Document Type
- Technical Report
- Publication Date
- Nov 01, 1968
- Accession Number
- AD0848471
Entities
People
- M. J. Turner
- S. B. Brummer