Interrelation Between the Formation Conditions, Structure, and Physical Properties of Thin Films of Intermetallic Compounds.
Abstract
The goal of this work was to obtain a better understanding between the relationship of the metallurgical structure to the magnetic and electrical properties of one such compound, 50 atom per cent (A/o) iron-50 A/o rhodium, in thin-film form. The types of magnetic phenomena that are presently being considered for use in large memory systems will be reviewed first, to provide background information for comparison with the properties obtainable with FeRh films; and then, the properties of bulk FeRh samples will be described to form a basis for comparison of the film properties presently obtainable to what might be obtainable as an ultimate goal. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 01, 1969
- Accession Number
- AD0851937
Entities
People
- James M. Lommel
Organizations
- General Electric