High Capacitance Thin Film Structures.

Abstract

The deposition conditions were established for high-capacitance nickel oxide films in the new multiple-source deposition system. Preliminary life test data and information on the uniformity of characteristics were obtained, and a procedure was developed for photolithographic etching of the nickel oxide films which is expected to be adaptable to silicon integrated processing. Characterization of the film surfaces by electron microscopy was also performed. (Author)

Document Details

Document Type
Technical Report
Publication Date
Dec 01, 1969
Accession Number
AD0863068

Entities

People

  • Alfred E. Feuersanger
  • Moe S. Wasserman

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Capacitance
  • Electron Microscopy
  • Electrons
  • Films
  • Life Tests
  • Microscopy
  • Oxide Films
  • Oxides
  • Thin Films

Readers

  • Electrical Engineering
  • Surface Coatings Technology.
  • Systems Analysis and Design

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene