Methods of Producing Thin Films,
Abstract
The report describes various methods of producing thin films, especially for microelectronics. In addition to the classical methods of forming thin films by vacuum vapor deposition, it also describes processes of diode sputtering and modern methods of cathode sputtering by means of a third electrode and a magnetic and high-frequency field which have a large number of advantages. These latter-mentioned methods enable the formation not only of films of metals and their alloys, but also semiconductor and especially insulation films. The features of these methods may advantageously be used in selecting capacitors and for the passivation of active surfaces in microelectronic circuits. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Dec 12, 1969
- Accession Number
- AD0866449
Entities
People
- Stanislav Lebeda
Organizations
- National Air and Space Intelligence Center