The Technology of Epitaxial Silicon Layers from SiCl4.
Abstract
Procedures for the deposition of epitaxial layers for integrated circuits were developed, and the capacity to produce device-quality epitaxial layers was successfully established. Specific problems that occurred were analyzed and corrective procedures outlined. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 30, 1970
- Accession Number
- AD0869162
Entities
People
- J. J. Symanski
Organizations
- Navy Electronics Laboratory