Fundamental Studies of Semiconductor Heteroepitaxy

Abstract

The report contains a fundamental study of the nucleation and film growth mechanisms in heteroepitaxial semiconductor thin films, and applies the results to the preparation of improved thin films and thin-film devices on insulating substrates. The program involves both theoretical and experimental investigations. The emphasis is on chemical vapor deposition (CVD) techniques.

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Document Details

Document Type
Technical Report
Publication Date
Jan 28, 1971
Accession Number
AD0879574

Entities

People

  • Ralph P. Ruth

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Chemical Reactions
  • Chemical Vapor Deposition
  • Compound Semiconductors
  • Crystal Structure
  • Crystals
  • Electrical Properties
  • Electron Microscopes
  • Energy Bands
  • Epitaxial Growth
  • Materials
  • Measurement
  • Semiconductors
  • Solid State Physics
  • Surface Properties
  • Thin Films
  • Transport Properties
  • Vapor Deposition

Fields of Study

  • Materials science

Readers

  • Semiconductor Device Technology
  • Systems Analysis and Design

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene