Monolithic Infrared Mosaic Sensors (3rd Year).
Abstract
The processing techniques and methods used to fabricate 100- x 178-element mosaics of germanium pnp phototransistors are presented. The use of a potassium cyanide soak as a prethermal treatment is described. The procedures for growing epitaxial layers of high quality are described as well as methods of controlling arsenic diffusion. Attention is given to many of the problems encountered and the solutions arrived at during this 3-year program. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 01, 1971
- Accession Number
- AD0882088
Entities
People
- D. L. Farnsworth
- E. L. Irwin
- J. Halsor
- P. De Wit
Organizations
- Westinghouse Electric Corporation