An Improved Capability for Electron Beam Area Definition.

Abstract

The broad objective of this program was to improve certain aspects of the Electron Image Projection System for the production of high density integrated circuits. An automatic alignment system was developed to allow percise alignments of electron images of integrated circuit patterns to previously existing patterns on silicon wafers. Typical best performance involved accuracies to plus or minus 1/4 micron in times of 2 to 5 seconds. Factors affecting photocathode sensitivity and life-time were investigated leading to improvements in both aspects. A UV source containing cadmium was developed. (Author)

Document Details

Document Type
Technical Report
Publication Date
Mar 01, 1971
Accession Number
AD0885549

Entities

People

  • Terence W. O'keeffe

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Accuracy
  • Automatic
  • Circuits
  • Electrical Equipment
  • Electron Beams
  • Electronic Equipment
  • Electrons
  • High Density
  • Integrated Circuits
  • Photocathodes
  • Production
  • Sensitivity

Readers

  • Electronics Engineering
  • Semiconductor Device Technology
  • Systems Analysis and Design

Technology Areas

  • Directed Energy
  • Microelectronics