Manufacturing Methods and Technology Measure. Ultraprecision Integrated-Circuit Photomasks.

Abstract

The objective of the manufacturing methods and technology measure (MMT) was to establish and demonstrate production techniques for ultraprecision integrated-circuit (IC) photomasks. The effectiveness of these techniques was to be verified by demonstrating the production capability for producing photomasks to a high degree of image accuracy. The effectiveness was to be further demonstrated by using the ultraprecision photomasks to manufacture IC's having better quality and higher yield. Engineering samples of photomask sets were manufactured and delivered to the contracting agency and to an in-house transistor wafer manufacturing area for pilot-line-production runs and evaluation of improved capabilities as the manufacturing methods and technology program progressed. This final report documents the successful accomplishment of all the goals of this MMT. (Author)

Document Details

Document Type
Technical Report
Publication Date
Feb 01, 1972
Accession Number
AD0893221

Entities

People

  • Eugene W. Conley
  • Irving F. Stacy

Tags

DTIC Thesaurus Topics

  • Accuracy
  • Circuits
  • Diagrams
  • Electrical Engineering
  • Engineering
  • Integrated Circuits
  • Manufacturing
  • Production
  • Production Engineering
  • Test And Evaluation
  • Transistors

Fields of Study

  • Engineering

Readers

  • Nanofabrication and Microfabrication.
  • Software Engineering