Production Engineering Measure for an Electron-Beam Machine and Microwave Transistors.
Abstract
The objective of this program is to establish and demonstrate, under production conditions, the use of electron-beam photolithography in the fabrication of integrable microwave transistors. During the fourth quarter of the contract, slice lot EBT-5 was processed to completion. A complete evaluation of this lot was made, and 20 engineering samples were shipped along with test results. Several units had maximum available gain as high as 7.24 dB at 6 GHz. A new transistor, ML-220, was designed to utilize the slower etch rate of electron-beam irradiated gold and the e-beam machine's small-geometry capability. Several lots of slices containing this new, potentially superior transistor were started. Automatic pattern registration was utilized on approximately 50% of the fields to further evaluate this operation on slices going through the transistor fabrication steps. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 01, 1972
- Accession Number
- AD0905641
Entities
People
- Daniel R. Ch'en
- Gilbert L. Varnell
- John M. Pankratz
Organizations
- Texas Instruments