Development of Non-Melt Deposition Techniques for Optical Coating for Reconnaissance.
Abstract
New infrared optical materials or material forms are now under development by WPAFB and ONR. These development programs will yield infrared optical window materials which will more nearly satisfy the flight dynamic requirements of avionics systems such as SCNA. Optical coatings which reduce surface reflections will be required to match or improve the environmental properties of the window material. Abrasion, salt-fog, and humidity resistance of existing multilayer antireflection coatings (MLAR) must be improved. Durability of such optical coatings produced by conventional means, such as thermal evaporation and electron beam evaporation, has reached a plateau. Non-melt techniques of deposition have been shown to produce durable optical films. The methods used were RF-sputtering, chemical vapor deposition (CVD), and reactive plasma deposition (RPD). Each process was used to deposit various optical films on infrared substrates. Spectral and environmental test results are reported along with deposition parameters and experimental data for each method. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 01, 1972
- Accession Number
- AD0905989
Entities
People
- Frank C. Sulzbach
- John C. Barnum
- Klaus C. Wiemer
- Lou H. Hall
- William R. Gardner
Organizations
- Texas Instruments