Production Engineering Measure for an Electron Beam Machine and Microwave Transistors.
Abstract
This report discusses the electron beam machine, a high performance ML-220 transistor, processing techniques, and yields. Data and analysis for transistor performance are provided as are machine and device specifications, pilot line requirements, and a disscussion of costs. In general the electron beam techniques developed during the contract are applicable to a variety of solid-state devices which require higher frequency performance and higher packing density. Some applications of electron beam techniques are magnetic bubble memories, charge-coupled devices, surface wave devices and field-effect transistors.
Document Details
- Document Type
- Technical Report
- Publication Date
- Sep 01, 1973
- Accession Number
- AD0914831
Entities
People
- Gilbert L. Varnell
- John M. Pankratz
- Linda T. Creagh
Organizations
- Texas Instruments