Semiconductor-Insulator Surface Studies in Ge and GaSb.
Abstract
Apparatus for the deposition of insulators (principally SiO2 on germanium is described. The results of C(V) measurements on MIS structures, after insulator deposition and after various high temperature anneals, are given. A surface state density of 5 x 10 to the 11th power/sq. cm. has been achieved. Experiments with the Liquid Phase Epitaxial (LPE) deposition of GaSb are described. Carrier densities and mobilities are comparable to values reported for other deposition techniques. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- May 01, 1973
- Accession Number
- AD0916715
Entities
People
- Richard W. Aldrich
Organizations
- General Electric