Microfabrication Techniques for Millimeter Wave Vacuum Electronics

Abstract

The principal challenge for creating vacuum electron devices in the millimeter-wave (mmW) frequency range is accurate fabrication of slow-wave circuits and other electromagnetic features with tight tolerance. Ultraviolet Photolithography and Electroforming (UVLIGA) techniques are presented that allow tight tolerance control for slow wave circuits for the mmW and sub-mmW bands. We show how these techniques were applied at the W- and G-bands.

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 2015
Accession Number
AD1004171

Entities

People

  • Alan M. Cook
  • Baruch Levush
  • Colin D. Joye
  • David Abe
  • Edward L. Wright
  • Igor A. Chernyavskiy
  • Jeffrey P. Calame
  • Jeremy M. Hanna
  • Khanh T. Nguyen

Organizations

  • United States Naval Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Additive Manufacturing
  • Circuits
  • Electrical Conductivity
  • Electrical Properties
  • Etching
  • Fabrication
  • Lithography
  • Machining
  • Manufacturing
  • Materials
  • Military Research
  • Millimeter Waves
  • Silicon Carbide
  • Thermal Conductivity
  • Traveling Wave Tubes
  • Waves
  • X Ray Lithography

Fields of Study

  • Physics

Readers

  • Integrated Circuit Design and Technology.
  • Microwave Engineering.
  • Thin Film Deposition Science.

Technology Areas

  • 5G
  • Microelectronics