Instrumentation for Epitaxial Growth of Complex Oxides

Abstract

The aim of this project was to acquire instrumentation to augment a molecular beam epitaxy (MBE) system used in the synthesis of complex oxide heterostructures. A RF oxygen plasma source was acquired to increase the oxidizing ability of the growth environment, an improvement that will prove critical in stabilizing materials with high oxidization states. The plasma source and accompanying electronics were purchased from Mantis Deposition, Inc and successfully installed on the MBE system. Additionally, a low noise electron source was acquired to improve in situ reflection high energy electron diffraction (RHEED) capabilities of monitoring thin film growth. The RHEED source was purchased from Staib Instruments and successfully installed on the MBE system. The equipment is and will be used extensively to synthesize complex oxide heterostructures for ongoing and future investigations of correlated electron behavior, electronic phase transitions, and novel electronic devices.

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Document Details

Document Type
Technical Report
Publication Date
Dec 17, 2015
Accession Number
AD1008612

Entities

People

  • Steven J May

Organizations

  • Drexel University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Department Of Defense
  • Diffraction
  • Electron Diffraction
  • Electronics
  • Engineering
  • Epitaxial Growth
  • Films
  • High Energy
  • Instrumentation
  • Low Noise
  • Materials
  • Materials Science
  • Molecular Beam Epitaxy
  • Molecular Beams
  • Phase Transformations
  • Students
  • Thin Films

Readers

  • Research Science/Academic Research
  • Semiconductor Device Technology
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene