Physiochemical Control of Composition and Location for Fundamental Studies of Biofouling Resistant, High Fouling Release Surfaces
Abstract
This contribution describes the development of Solution Exchange Lithography as a novel, modular methodology for sequential photopatterning. Without ever (re)moving the substrate, this approach readily combines (externally regulated) polymerization and subsequent post modification to dial in any desirable surface property with precise spatial control. This enables the continuous fabrication of hierarchically patterned polymer brushes with chemically complex architectures.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 22, 2016
- Accession Number
- AD1012773
Entities
People
- Christian W. Pester
- Craig Hawker
Organizations
- University of California, Santa Barbara