Hybrid Physical Vapor Deposition Instrument for Advanced Functional Multilayers and Materials

Abstract

PI Maria received support to construct a physical vapor deposition (PVD) system that combines electron beam (ebeam) evaporation, magnetron sputtering, pulsed laser ablation, and ion-assisted deposition. The instrumentation enables clean, uniform, and rapid deposition of a wide variety of metallic, semiconducting, and ceramic thin films with microstructures and composite geometries enhanced by energetic bombardment during growth.

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Document Details

Document Type
Technical Report
Publication Date
Apr 27, 2016
Accession Number
AD1014783

Entities

People

  • Jon-Paul Maria

Organizations

  • North Carolina State University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Chemical Engineering
  • Chemistry
  • Department Of Defense
  • Electronic Components
  • Engineering
  • Films
  • Geometry
  • Instrumentation
  • Materials
  • Materials Processing
  • Materials Science
  • Metal Oxides
  • Physical Vapor Deposition
  • Pulsed Lasers
  • Students
  • Thin Films
  • Vapor Deposition

Readers

  • Research Science/Academic Research
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene