Nanostructure Fabrication of Zero-Dimensional Quantum Dot Diodes

Abstract

The nanofabrication techniques which are used to create quantum dot diodes will be discussed. The device is a vertical resonant tunneling diode where the lateral dimensions are reduced to approximately 1000 A. Electron beam lithography is used to pattern a small self-aligned metal dot top contact and etch mask.

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Document Details

Document Type
Technical Report
Publication Date
Dec 01, 1988
Accession Number
AD1015280

Entities

People

  • J. N. Randall
  • M. A. Reed
  • R. J. Matyi
  • T. M. Moore

Organizations

  • Texas Instruments

Tags

DTIC Thesaurus Topics

  • Diodes
  • Electron Beam Lithography
  • Electron Beams
  • Fabrication
  • Lithography
  • Nanofabrication
  • Quantum Dots
  • Quantum Tunneling
  • Resonant Tunneling Diodes
  • Tunnel Diodes

Fields of Study

  • Materials science

Readers

  • Nanofabrication and Microfabrication.
  • Nanoscale Plasmonic Nanotechnology
  • Quantum spin resonance or Electron Paramagnetic Resonance spectroscopy.

Technology Areas

  • Directed Energy
  • Microelectronics
  • Microelectronics - Graphene
  • Quantum Computing