Study of Radiation Hardness of Lattice Matched AlInN/GaN HEMT Heterostructures
Abstract
The objective of this project is to gain fundamental understanding of radiation mechanisms inAlInN/GaN based high electron mobility transistor (HEMT) heterostructures and devices. Gaining such basic knowledge can reduce the risk to the development of emerging GaN based electronics that are resistant to nuclear and space radiation effects. This project is part of the field of wide bandgap high power, high frequency electronics, as well as fundamental materials science of these materials. The technical approach consists of investigating the atom probe tomography (APT) of strain free, lattice matched AlInN/GaN heterostructures and devices after irradiation. APT offers the unique combination of field ion microscopy and time-of-flight spectroscopy to enable the 3D reconstruction map of elements in a structure with theoretically chemical isotope resolution capability and atomic spatial resolution. As such, atom probe tomography is potentially uniquely capable of identifying radiation induced defects in the electronic materials of interest.
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 01, 2016
- Accession Number
- AD1019107
Entities
People
- Patrick Kung
Organizations
- University of Alabama