Simulations of Proton Implantation in Silicon Carbide (SiC)

Abstract

We report on exploratory research effort with preliminary results on investigating fundamental radiation effects in micromachined silicon carbide (SiC) structures and devices. In this technical digest, we briefly present a computer simulation study on the effects of implanting protons (hydrogen ions, H+) into SiC thin layers on silicon(Si) substrate, and explore the ion implantation conditions that are relevant to experimental radiation of SiC layers.

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Document Details

Document Type
Technical Report
Publication Date
Mar 31, 2016
Accession Number
AD1025395

Entities

People

  • Hailong Chen
  • Jonathan P. McCandless
  • Philip X-L Feng

Organizations

  • Case Western Reserve University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Compound Semiconductors
  • Computer Simulations
  • Electrical Engineering
  • Engineering
  • Implantation
  • Ion Implantation
  • Ions
  • Liquid Phases
  • Protons
  • Silicon
  • Silicon Carbide
  • Simulations
  • Simulators
  • Substrates
  • Thermal Conductivity
  • Thickness
  • Wide Bandgap Semiconductors

Fields of Study

  • Physics

Readers

  • Integrated Circuit Design and Technology.
  • Semiconductor Device Technology
  • Technical Research and Report Writing.