Atomistic- and Meso-Scale Computational Simulations for Developing Multi-Timescale Theory for Radiation Degradation in Electronic and Optoelectronic Devices
Abstract
This project will support a research effort at the University of Michigan to simulate atomistic- and meso-scale behavior of defect evolutions in compound semiconductors, including ultrafast displacement cascade, intermediate defect stabilization and cluster formation, as well as slow defect reaction and migration. The fundamental mechanisms and knowledge gained from atomic- and meso-scale simulations will be input into rate-diffusion theory as initial conditions to calculate the steady-state distribution of point defects in a mesoscopic layered structured system, thus allowing the development of a multi-timescale theory to study radiation degradation in electronic and optoelectronic devices.
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 13, 2017
- Accession Number
- AD1030636
Entities
People
- Fei Gao
Organizations
- University of Michigan