Wafer-Scale Aluminum Nanoplasmonic Resonators with Optimized Metal Deposition
Abstract
Spectroscopic ellipsometry is demonstrated to be an effective technique for assessing thequality of plasmonic resonances within aluminum nanostructures deposited with multiple techniques.The resonance quality of nanoplasmonic aluminum arrays is shown to be strongly dependent on themethod of aluminum deposition. Three-layer metal-dielectric-metal nanopillar arrays were fabricated ina complementary metal-oxide semiconductor (CMOS) facility, with the arrays of nanopillars separatedfrom a continuous metal underlayer by a thin dielectric spacer, to provide optimum field enhancement.Nanostructures patterned in optimized aluminum, which had been deposited with a high temperaturesputtering process followed by chemical mechanical planarization, display different resonance anddepolarization behavior than nanostructures deposited by the more conventional evaporation process.Full plasmonic band diagrams are mapped over a wide range of incidence angles and wavelengths usingspectroscopic ellipsometry, and compared for aluminum nanostructures fabricated with two methods.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 04, 2016
- Accession Number
- AD1034016
Entities
People
- Corey Stull
- Donna M. Lennon
- Kenneth A. Diest
- Matthew T Cook
- Mordechai Rothschild
- Stefan Schoeche
- Vladimir Liberman
Organizations
- MIT Lincoln Laboratory