GeSn/Si Avalanche Photodetectors on Si substrates

Abstract

In this project, firstly, the material growth of GeSn by chemical vapor deposition (CVD) system has been investigated. The material growth mechanism was in-depth studied; secondly, the material and optical characterizations have been conducted, including SEM, TEM, XRD, Raman, PL and ellipsometry spectroscopy. The results indicated that the device level material quality was achieved; thirdly, the GeSn samples were fabricated into LEDs and photo detectors, whose operating wavelength coverd from 1700 to 2600 nm. Particularly, the responsivity of GeSn photoconductor was higher than that of III-V photo detector, and the D* of GeSn photodiode was only one order of magnitude lower than that of extend-InGaAs detector, indicating the promising future applications of these type of photodetectors. Based on the characterization results, the GeSn photo detector as a potential candidate for low-cost uncooled multi-color infrared focal-plane-array was proposed. (FPA) application

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Document Details

Document Type
Technical Report
Publication Date
Sep 16, 2016
Accession Number
AD1037717

Entities

People

  • Hameed Naseem
  • Shui-Qing Yu

Organizations

  • University of Arkansas

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Band Gaps
  • Chemical Vapor Deposition
  • Complementary Metal-Oxide Semiconductors
  • Crystal Lattices
  • Detection
  • Detectors
  • Diffraction
  • Electron Microscopy
  • Energy Bands
  • Infrared Detection
  • Measurement
  • Optical Properties
  • Optics
  • Optoelectronic Devices
  • Semiconductors
  • Spectra
  • Spectroscopy

Fields of Study

  • Materials science

Readers

  • Semiconductor Device Technology

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition