Fabrication of 3D Si based Photonic Crystal Structure with Single Self Aligned Etching Process
Abstract
We have designed and developed a simplified three-dimensional (3D) photonic crystal (PhC) fabrication technique that can be used to fabricate a nanoscale 3D structure from the two-dimensional (2D) surface of a silicon (Si), or silicon on insulator (SOI) wafer with a single modified Bosch plasma etching process. Using this technique, we demonstrated such a PhC structure that includes hollow-core waveguides with high-contrast gratings as cladding. The etching process produces deep trenches with controlled width variation along the vertical direction. This method uses only a single mask (such as e-beam lithography mask) without alignment, and there is no need for deposition, regrowth, etc. This technique may greatly reduce the fabrication cost and increase the yield of 3D PhC devices.
Document Details
- Document Type
- Technical Report
- Publication Date
- Sep 01, 2010
- Accession Number
- AD1043291
Entities
People
- Gerard Dang
- Monica Taysing-lara
- Weimin Zhou
Organizations
- United States Army Research Laboratory