Group-IV Interband and Intersubband Semiconductor Lasers Based on SiGe Nanomembranes
Abstract
This project has been aimed at the development of mid- and far-infrared laser active materials based on the group-IV semiconductors Si, Ge, and SiGe (the leading materials platform of microelectronics). Because of their intrinsic CMOS compatibility, group-IV diode lasers have significant technological potential, including applications of high relevance to the DoD mission. Their implementation, however, is severely complicated by the indirect-bandgap nature of Si(Ge). Our approach to address this challenge has been based on the use of group-IV nanomembranes (NMs) in two novel ways: (1) the formation of direct-bandgap Ge through the introduction of large biaxial tensile strain in mechanically stressed Ge NMs, and(2) the development of high-quality SiGe THz quantum cascade structures consisting of strain-engineered multiple-quantum-well NMs.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 19, 2018
- Accession Number
- AD1057734
Entities
People
- Max G. Lagally
- Roberto Paiella