Instrumentation Up-Fit for Reactive Nanolaminate PVD

Abstract

PI Maria conducted an instrument upfit for physical vapor deposition (PVD) systems that combines electron beam (e-beam) evaporation with magnetron sputtering and pulsed laser deposition. The original instrumentation was supported by a 2014 DURIP award to enable clean, uniform, and rapid deposition of a wide variety of metallic, semiconducting, and ceramic thin films that serve multiple current and pending DoD programs at NCSU. While this instrumentation benefits several programs, its primary role is to support nanoenergetic materials research and the new NCSU-led MURI: Multi-modal Energy Flow at Atomically Engineered Interfaces.

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Document Details

Document Type
Technical Report
Publication Date
Dec 14, 2016
Accession Number
AD1058847

Entities

People

  • Jon-Paul Maria

Organizations

  • North Carolina State University

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Department Of Defense
  • Electron Beams
  • Engineering
  • Evaporation
  • Films
  • High Temperature
  • Materials
  • Materials Processing
  • Materials Science
  • Mathematics
  • Nanoenergetics
  • Physical Vapor Deposition
  • Pulsed Lasers
  • Sputtering
  • Students
  • Thin Films
  • Vapor Deposition

Fields of Study

  • Physics

Readers

  • Research Science/Academic Research
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene